Voltammetric Behaviour of Two Stacking Layers of Copper-Bound 3-Mercaptopropionic Self-Assembled Monolayers on Gold Electrode and Application in Enhancement of Detection of Cu(II)

P.H. Phong; N.H. Anh; L.Q. Hung; N.T.C. Ha; V.T.T. Ha

doi:10.14233/ajchem.2013.13077

Issue

Vol. 25 No. 3 (2013): Vol 25 Issue 3

Issue Published : October 8, 2012

This work is licensed under a Creative Commons Attribution 4.0 International License.

Voltammetric Behaviour of Two Stacking Layers of Copper-Bound 3-Mercaptopropionic Self-Assembled Monolayers on Gold Electrode and Application in Enhancement of Detection of Cu(II)

https://doi.org/10.14233/ajchem.2013.13077

P.H. Phong

Institute of Chemistry, Vietnam Academy of Science and Technology, 18 Hoang Quoc Viet Road, Cau Giay District, Hanoi, Vietnam

N.H. Anh

Institute of Chemistry, Vietnam Academy of Science and Technology, 18 Hoang Quoc Viet Road, Cau Giay District, Hanoi, Vietnam

L.Q. Hung

Institute of Chemistry, Vietnam Academy of Science and Technology, 18 Hoang Quoc Viet Road, Cau Giay District, Hanoi, Vietnam

N.T.C. Ha

Faculty of Chemistry, Ha Noi University of Science, Vietnam National University, 19 Le Thanh Tong Street, Hanoi, Vietnam

V.T.T. Ha

Institute of Chemistry, Vietnam Academy of Science and Technology, 18 Hoang Quoc Viet Road, Cau Giay District, Hanoi, Vietnam

Corresponding Author(s) : P.H. Phong

phongph@ich.vast.ac.vn

Asian Journal of Chemistry, Vol. 25 No. 3 (2013): Vol 25 Issue 3
Article Published : October 9, 2012

Abstract

Formation of two stacking layers composed of copper-bound self-assembled monolayer (SAM) of 3-mercaptopropionic acid (MPA) for modifying the gold electrode has been studied by electrochemical method. Stack of self-assembled monolayers of 3-mercaptopropionic acid via a Cu(II) layer was elucidated by peak potentials and charge values obtained from cyclic voltammetry for reductive desorption of self-assembled monolayer in 0.5 M KOH solution. The attachment of Cu(II) layers to self-assembled monolayers was detected by differential pulse voltammetry with the appearance of a reduction peak at 0.18 V. This modified electrode has been successfully used for enhancing the sensitivity in determination of Cu²⁺ ions at picomolar concentration. The linear range obtained from 1.56 × 10^-12-1.56 × 10^-9 M with a correlation coefficient of 0.9962. The detection limit approached to 9.10 × 10^-13 M. The electrochemical behaviour of the modified electrode was also obtained for speculating further formation and structure features.

Keywords

Self-assembled monolayer Two stacking layers Copper-bound 3-mercaptopropionic acid

Phong, P., Anh, N., Hung, L., Ha, N., & Ha, V. (2012). Voltammetric Behaviour of Two Stacking Layers of Copper-Bound 3-Mercaptopropionic Self-Assembled Monolayers on Gold Electrode and Application in Enhancement of Detection of Cu(II). Asian Journal of Chemistry, 25(3), 1456–1460. https://doi.org/10.14233/ajchem.2013.13077

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References

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W. Lin, G.K. Wong and T.J. Marks, J. Am. Chem. Soc., 118, 8034 (1996).

M. Brust, P.M. Blass and A.J. Bard, Langmuir, 13, 5602 (1997).

A. Hatzor and P.S. Weiss, Science, 291, 1019 (2001).

M.E. Anderson, C. Srinivasan, R. Jayaraman, P.S. Weiss and M.W. Horn, Microelectron. Eng., 248, 78 (2005).

G.S. McCarty, Nano Lett., 4, 1391 (2004).

L. Netzer and J. Sagiv, J. Am. Chem. Soc., 105, 674 (1983).

H. Lee, L.J. Kepley, H.G. Hong and T.E. Mallouk, J. Am. Chem. Soc., 110, 618 (1998).

S.D. Evans, A. Ulman, K.E. Goppert-Berarducci and L.J. Gerenser, J. Am. Chem. Soc., 113, 5866 (1991).

T.L. Freeman, S.D. Evans and A. Ulman, Langmuir, 11, 4411 (1995).

T.A. Daniel, S. Uppli, G. McCarty and D.L. Allara, Langmuir, 23, 638 (2007).

T.L. Freeman, S.D. Evans and A. Ulman, Thin Solid Films, 244, 784 (1994).

D.W. Hatchett, R.H. Uibel, K.J. Stevenson, J.M. Harris and H.S. White, J. Am. Chem. Soc., 120, 1062 (1998).

K.C. Honeychurch, D.M. Hawkins, J.P. Hart and D.C. Cowell, Talanta, 57, 565 (2002).

D.G. Barceloux, J. Toxicol. Clin. Toxic, 37, 761 (1999).

Y.N. Jiang, H.Q. Luo and N.B. Li, 22, 1079 (2006).

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M.S. El-Deab, K. Arihara and T. Ohsaha, J. Electrochem. Soc., 151, E213 (2004).

C.J. Zhong and M.D. Porter, J. Electroanal. Chem., 425, 147 (1997).

K. Arihara, T. Ariga, N. Takashima, K. Arihara, T. Okajima, F. Kitamura, K. Tokuda and T. Ohsaka, Phys. Chem. Chem. Phys., 5, 3758 (2003).

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R. Zhang and A.J. Gellman, J. Phys. Chem., 95, 7433 (1991).

R.G. Nuzzo, L.H. Dubois and D.L. Allara, J. Am. Chem. Soc., 112, 558 (1990).

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A.J. Bard and L.R. Faulkner, Electrochemical Methods: Fundamentals and Application, Wiley & Sons, Inc. New York, edn. 2, Ch. 14, p. 591 (2001).

H.O. Finklea, Electrochemistry of Oganized Monolayers of Thiols and Related Molecules on Electrodes, Marcel Dekker, Inc. New York, Vol. 19, Ch. 5, p. 243 (1999).

Issue

Vol. 25 No. 3 (2013): Vol 25 Issue 3

Voltammetric Behaviour of Two Stacking Layers of Copper-Bound 3-Mercaptopropionic Self-Assembled Monolayers on Gold Electrode and Application in Enhancement of Detection of Cu(II)

Corresponding Author(s) : P.H. Phong

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