AZO (ZnO:Al) Transparent Conductive Film Prepared by Plasma Enhanced Chemical Vapour Deposition and its Performances in Comparison with ZnO Film

Zhaoquan Chen; Longji Zhu; Lingli Hong; Changguo Xue; Minghai Liu; Xiaoliang Zheng; Yelin Hu; Qiubo Ye; Xiwei Hu3

doi:10.14233/ajchem.2014.17305

Issue

Vol. 26 No. 6 (2014): Vol 26 Issue 6

Issue Published : March 10, 2014

This work is licensed under a Creative Commons Attribution 4.0 International License.

AZO (ZnO:Al) Transparent Conductive Film Prepared by Plasma Enhanced Chemical Vapour Deposition and its Performances in Comparison with ZnO Film

https://doi.org/10.14233/ajchem.2014.17305

Zhaoquan Chen

College of Electrical & Information Engineering, Anhui University of Science and Technology, Huainan 232001, P.R. China

Longji Zhu

College of Electrical & Information Engineering, Anhui University of Science and Technology, Huainan 232001, P.R. China

Lingli Hong

College of Materials Science & Engineering, Anhui University of Science and Technology, Huainan 232001, P.R. China

Changguo Xue

College of Materials Science & Engineering, Anhui University of Science and Technology, Huainan 232001, P.R. China

Minghai Liu

State Key Laboratory of Advanced Electromagnetic Engineering and Technology, Huazhong University of Science and Technology, Wuhan 430074, P.R. China

Xiaoliang Zheng

College of Electrical & Information Engineering, Anhui University of Science and Technology, Huainan 232001, P.R. China

Yelin Hu

College of Electrical & Information Engineering, Anhui University of Science and Technology, Huainan 232001, P.R. China

Qiubo Ye

College of Electrical & Information Engineering, Anhui University of Science and Technology, Huainan 232001, P.R. China

Xiwei Hu3

1College of Electrical & Information Engineering, Anhui University of Science and Technology, Huainan 232001, P.R. China 2College of Materials Science & Engineering, Anhui University of Science and Technology, Huainan 232001, P.R. China 3State Key Laboratory of Advanced Electromagnetic Engineering and Technology, Huazhong University of Science and Technology, Wuhan 430074, P.R. China *Corresponding author: E-mail: zqchen@aust.edu.cn; zhulj@aust.edu.cn

Corresponding Author(s) : Zhaoquan Chen

zqchen@aust.edu.cn

Asian Journal of Chemistry, Vol. 26 No. 6 (2014): Vol 26 Issue 6
Article Published : March 12, 2014

Abstract

In this paper, AZO(ZnO:Al) polycrystalline thin films have been fabricated by PECVD (plasma enhanced chemical vapour deposition) method. Based on PECVD method, the fabrication process of AZO film is shown in detail. Furthermore, the measurements of the film electro-optical properties have been bringing forth, in comparison with ZnO film. The results suggested that based on PECVD method, AZO films with strong adhesion to the substrate, as low as 89 W/% of square resistance and as high as 85 % of visible light transmittance have been deposited on the glass substrate and the silicon substrate, respectively.

Keywords

AZO (ZnO:Al) Plasma enhanced chemical vapour deposition Transparent conductive film

Chen, Z., Zhu, L., Hong, L., Xue, C., Liu, M., Zheng, X., … Hu3, X. (2014). AZO (ZnO:Al) Transparent Conductive Film Prepared by Plasma Enhanced Chemical Vapour Deposition and its Performances in Comparison with ZnO Film. Asian Journal of Chemistry, 26(6), 1625–1627. https://doi.org/10.14233/ajchem.2014.17305

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References

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References

R. Groenen, J. Löffler, P.M. Sommeling, J.L. Linden, E.A.G. Hamers, R.E.I. Schropp and M.C.M. van de Sanden, Thin Solid Films, 392, 226 (2001); doi:10.1016/S0040-6090(01)01032-X.

A. Stadler, Materials, 5, 661 (2012); doi:10.3390/ma5040661.

A.N. Banerjee and K.K. Chattopadhyay, Central Eur. J. Phys., 6, 57 (2008); doi:10.2478/s11534-008-0005-5.

H.J. Jin, M.J. Song and C.B. Park, Physica B, 404, 1097 (2009); doi:10.1016/j.physb.2008.11.078.

Z.H. Qiao, C. Agashe and D. Mergel, Thin Solid Films, 496, 520 (2006); doi:10.1016/j.tsf.2005.08.282.

J.F. Chang and M.H. Hon, Thin Solid Films, 386, 79 (2001); doi:10.1016/S0040-6090(00)01891-5.

S.Y. Kuo, W.C. Chen, F.I. Lai, C.P. Cheng, H.C. Kuo, S.C. Wang and W.H. Hsieh, J. Cryst. Growth, 287, 78 (2006); doi:10.1016/j.jcrysgro.2005.10.047.

O. Kluth, B. Rech, L. Houben, S. Wieder, G. Schöpe, C. Beneking, H. Wagner, A. Löffl and H.W. Schock, Thin Solid Films, 351, 247 (1999); doi:10.1016/S0040-6090(99)00085-1.

Issue

Vol. 26 No. 6 (2014): Vol 26 Issue 6

AZO (ZnO:Al) Transparent Conductive Film Prepared by Plasma Enhanced Chemical Vapour Deposition and its Performances in Comparison with ZnO Film

Corresponding Author(s) : Zhaoquan Chen

Abstract

Keywords

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