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Vol. 35 No. 1 (2023): Vol 35 Issue 1

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Spray Deposited Ni Doped Co3O4 Thin Films for Electrochemical Applications

https://doi.org/10.14233/ajchem.2023.23991
S.K. Jasmin Vijitha
Department of Physics & Research Centre, Muslim Arts College, Thiruvithancode-629174, India
K. Mohanraj
Department of Physics, Manonmaniam Sundaranar University, Tirunelveli-627012, India ; Department of Physics, School of Basic and Applied Sciences, Central University of Tamil Nadu, Thiruvarur-610005, India
R.P. Jebin
Department of Physics & Research Centre, Muslim Arts College, Thiruvithancode-629174, India

Corresponding Author(s) : K. Mohanraj

kmohanraj.msu@gmail.com

Asian Journal of Chemistry, Vol. 35 No. 1 (2023): Vol 35 Issue 1

Abstract

Nickel-doped Co3O4 films were prepared using fluorine doped tin oxide (FTO) substrates at various nickel concentrations (x = 0.025, 0.05, 0.075 and 0.1) using a spray pyrolyzed process at 300 ºC. Experimental techniques were used to characterize the materials by XRD, SEM, EDAX, UV-Vis, FTIR spectroscopy, magnetic susceptibility and cyclic voltammetry. When nickel is present in any concentration of Co3O4, the structural analysis using XRD confirms the spinel cubic structure of the material. By using a scanning electron microscope, porous morphological studies are conducted. EDAX examines the chemical composition of the prepared thin films. A 0.050 M concentrations demonstrated the ideal structure, good morphological analysis and energy bandgap. Based on the results, the prepared films were effectively used in the electrochemical performance.

Keywords

Ni-doped Co3O4 Thin film Cyclic voltammetry Electrochemical studies
Jasmin Vijitha, S., Mohanraj, K., & Jebin, R. (2022). Spray Deposited Ni Doped Co3O4 Thin Films for Electrochemical Applications. Asian Journal of Chemistry, 35(1), 239–246. https://doi.org/10.14233/ajchem.2023.23991
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