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Optical and Structural Properties of Bi/Ag-I Thin Film by Co-precipitation Method
Asian Journal of Chemistry,
Vol. 28 No. 10 (2016): Vol 28 Issue 10
Abstract
Bi/Ag-I thin films have been deposited on glass substrates using co-precipitation method. Investigation of the Bi-Ag-I thin film was made of structural and optical properties. The structures of the films were characterized by X-ray diffraction and scanning electron microscopy. Uniform distribution of grains was clearly seen in the photograph of scanning electron microscope under the 90° deposition temperature. The optical properties were investigated with UV-visible. The transmittance and optical band gap (Eg) were increased with pH which was up to 80 % and 4.02 at 70° deposition temperature. The structure of BiI3 was observed in XRD analysis at 90° deposition temperature. The atom planes were changed with deposition temperature. The film thickness of Bi/Ag-I thin films changed irregularly with deposition temperature.
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- R.H. Ottewill and R.F. Woodbridge, J. Colloid Sci., 16, 581 (1961); doi:10.1016/0095-8522(61)90045-9.
- C.R. Berry, Phys. Rev., 161, 848 (1967); doi:10.1103/PhysRev.161.848.
- D. Hayes, K.H. Schmidt and D. Meisel, J. Phys. Chem., 93, 6100 (1989); doi:10.1021/j100353a031.
- P. Mulvaney, Colloid Surf. A, 81, 231 (1993); doi:10.1016/0927-7757(93)80250-I.
- M.I. Vucemilovic and O.I. Micic, Radiat. Phys. Chem., 32, 79 (1988); doi:10.1016/1359-0197(88)90017-3.
- O.I. Micic, M.T. Nenadovic, T. Rajh, J.M. Nedeljkovic and M.I. Vucemilovic, Prog. Colloid Polym. Sci., 76, 20 (1988).
- K.H. Schmidt, R. Patel and D. Meisel, J. Am. Chem. Soc., 110, 4882 (1988); doi:10.1021/ja00223a002.
- A. Henglein, J. Phys. Chem., 97, 5457 (1993); doi:10.1021/j100123a004.
- O.I. Micic, M. Meglic, D. Lawless, D.K. Sharma and N. Serpone, Langmuir, 6, 487 (1990); doi:10.1021/la00092a032.
- S. Chen, T. Ida and K. Kimura, J. Phys. Chem. B, 102, 6169 (1998); doi:10.1021/jp9809991.
- M.C. Brelle and J.Z. Zhang, J. Chem. Phys., 108, 3119 (1998); doi:10.1063/1.475709.
- T. Ida and K. Kimura, Solid State Ion., 107, 313 (1998); doi:10.1016/S0167-2738(98)00002-2.
- Y.H. Wang, J.M. Mo, W.L. Cai, L.Z. Yao and L. Zhang, J. Mater. Res., 16, 990 (2001); doi:10.1557/JMR.2001.0139.
- J.H. Kennedy, Thin Solid Films, 43, 41 (1977); doi:10.1016/0040-6090(77)90380-7.
- S. Ves, D. Glötzel, M. Cardona and H. Overhof, Phys. Rev. B, 24, 3073 (1981); doi:10.1103/PhysRevB.24.3073.
- A. Goswami, Thin Film Fundamentals, New Age International Pvt. Ltd., New Delhi, India (1996).
- R.F. Warren and W.Y. Liang, J. Phys. Condens. Matter, 5, 6407 (1993); doi:10.1088/0953-8984/5/35/006.
- C.C. Coleman, B. Magness, P. Melo, H. Goldwhite, W. Tikkanen, Q. Tham, K. Pham, R. Jacubinas, R.B. Kaner and R.E. Treece, J. Phys. Chem. Solids, 57, 1153 (1996); doi:10.1016/0022-3697(95)00414-9.
- N. Preda, L. Mihut, M. Baibarac, I. Baltog and S. Lefrant, J. Phys. Condens. Matter, 18, 8899 (2006); doi:10.1088/0953-8984/18/39/020.
- N. Preda, L. Mihut, M. Baibarac, I. Baltog, R. Ramer, J. Pandele, C. Andronescu and V. Fruth, J. Mater. Sci. Mater. Electron., 20(S1), 465 (2009); doi:10.1007/s10854-008-9681-6.
- M. Schluter, M.L. Cohen, S.E. Kohn and C.Y. Fong, Phys. Status Solidi, B Basic Res., 78, 737 (1976); doi:10.1002/pssb.2220780235.
- T. Komatsu, Y. Kaifu, S. Takeyama and N. Miura, Phys. Rev. Lett., 58, 2259 (1987); doi:10.1103/PhysRevLett.58.2259.
- A.M. Ghorayeb, C.C. Coleman and A.D. Yoffe, J. Phys. C Solid State Phys., 17, L715 (1984); doi:10.1088/0022-3719/17/27/005.
- A. Patanarut, E.H. Williams, E. Petricoin, L.A. Liotta and B. Bishop, Polymers, 3, 1181 (2011); doi:10.3390/polym3031181.
- X. Zhang, L. Xu, J. Yuan, Y. Zhang, C. Lu and X. Li, Chin. J. Catal., 30, 613 (2009).
- J.S. Lee, St. Adams and J.A. Maier, Solid State Ion., 136-137, 1261 (2000); doi:10.1016/S0167-2738(00)00583-X.
- T.K. Pati and M.I. Talele, Adv. Appl. Sci. Res., 3, 1702 (2012).
- I.A. Kariper, Int. J. Mıner. Met. Mater., 21, 832 (2014); doi:10.1007/s12613-014-0978-6.
References
R.H. Ottewill and R.F. Woodbridge, J. Colloid Sci., 16, 581 (1961); doi:10.1016/0095-8522(61)90045-9.
C.R. Berry, Phys. Rev., 161, 848 (1967); doi:10.1103/PhysRev.161.848.
D. Hayes, K.H. Schmidt and D. Meisel, J. Phys. Chem., 93, 6100 (1989); doi:10.1021/j100353a031.
P. Mulvaney, Colloid Surf. A, 81, 231 (1993); doi:10.1016/0927-7757(93)80250-I.
M.I. Vucemilovic and O.I. Micic, Radiat. Phys. Chem., 32, 79 (1988); doi:10.1016/1359-0197(88)90017-3.
O.I. Micic, M.T. Nenadovic, T. Rajh, J.M. Nedeljkovic and M.I. Vucemilovic, Prog. Colloid Polym. Sci., 76, 20 (1988).
K.H. Schmidt, R. Patel and D. Meisel, J. Am. Chem. Soc., 110, 4882 (1988); doi:10.1021/ja00223a002.
A. Henglein, J. Phys. Chem., 97, 5457 (1993); doi:10.1021/j100123a004.
O.I. Micic, M. Meglic, D. Lawless, D.K. Sharma and N. Serpone, Langmuir, 6, 487 (1990); doi:10.1021/la00092a032.
S. Chen, T. Ida and K. Kimura, J. Phys. Chem. B, 102, 6169 (1998); doi:10.1021/jp9809991.
M.C. Brelle and J.Z. Zhang, J. Chem. Phys., 108, 3119 (1998); doi:10.1063/1.475709.
T. Ida and K. Kimura, Solid State Ion., 107, 313 (1998); doi:10.1016/S0167-2738(98)00002-2.
Y.H. Wang, J.M. Mo, W.L. Cai, L.Z. Yao and L. Zhang, J. Mater. Res., 16, 990 (2001); doi:10.1557/JMR.2001.0139.
J.H. Kennedy, Thin Solid Films, 43, 41 (1977); doi:10.1016/0040-6090(77)90380-7.
S. Ves, D. Glötzel, M. Cardona and H. Overhof, Phys. Rev. B, 24, 3073 (1981); doi:10.1103/PhysRevB.24.3073.
A. Goswami, Thin Film Fundamentals, New Age International Pvt. Ltd., New Delhi, India (1996).
R.F. Warren and W.Y. Liang, J. Phys. Condens. Matter, 5, 6407 (1993); doi:10.1088/0953-8984/5/35/006.
C.C. Coleman, B. Magness, P. Melo, H. Goldwhite, W. Tikkanen, Q. Tham, K. Pham, R. Jacubinas, R.B. Kaner and R.E. Treece, J. Phys. Chem. Solids, 57, 1153 (1996); doi:10.1016/0022-3697(95)00414-9.
N. Preda, L. Mihut, M. Baibarac, I. Baltog and S. Lefrant, J. Phys. Condens. Matter, 18, 8899 (2006); doi:10.1088/0953-8984/18/39/020.
N. Preda, L. Mihut, M. Baibarac, I. Baltog, R. Ramer, J. Pandele, C. Andronescu and V. Fruth, J. Mater. Sci. Mater. Electron., 20(S1), 465 (2009); doi:10.1007/s10854-008-9681-6.
M. Schluter, M.L. Cohen, S.E. Kohn and C.Y. Fong, Phys. Status Solidi, B Basic Res., 78, 737 (1976); doi:10.1002/pssb.2220780235.
T. Komatsu, Y. Kaifu, S. Takeyama and N. Miura, Phys. Rev. Lett., 58, 2259 (1987); doi:10.1103/PhysRevLett.58.2259.
A.M. Ghorayeb, C.C. Coleman and A.D. Yoffe, J. Phys. C Solid State Phys., 17, L715 (1984); doi:10.1088/0022-3719/17/27/005.
A. Patanarut, E.H. Williams, E. Petricoin, L.A. Liotta and B. Bishop, Polymers, 3, 1181 (2011); doi:10.3390/polym3031181.
X. Zhang, L. Xu, J. Yuan, Y. Zhang, C. Lu and X. Li, Chin. J. Catal., 30, 613 (2009).
J.S. Lee, St. Adams and J.A. Maier, Solid State Ion., 136-137, 1261 (2000); doi:10.1016/S0167-2738(00)00583-X.
T.K. Pati and M.I. Talele, Adv. Appl. Sci. Res., 3, 1702 (2012).
I.A. Kariper, Int. J. Mıner. Met. Mater., 21, 832 (2014); doi:10.1007/s12613-014-0978-6.