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Scan Range Analysis According to Variation of Einzel Lens Electrode Gap in Microcolumn
Corresponding Author(s) : Young-Chul Kim
Asian Journal of Chemistry,
Vol. 26 No. 5 (2014): Vol 26 Issue 5
Abstract
Microcolumn is a miniaturized electron optical system having a miniaturized electron emitter, electrostatic source lenses, deflectors and an Einzel lens. The optimization of each components are still technically challenging for aberration-free e-beam operation, high quality imaging and large field of view. This paper discusses the influence of gap between Einzel lens electrodes on scan range and focusing nature in various modes of operation. In source lens focusing mode, the scan range is found to be increased with reducing the gap, but the result was opposite in two lens focusing mode where both source and Einzel lens were used for focusing the beam. We also proved these results through simulation analysis on electron beam trajectory and electric field.
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- S.Y. Chen, H.T. Ng, S.Y. Ma, H.H. Chen, C.H. Liu and K.Y. Tsai, J. Vac. Sci. Technol. B, 29, 06FD04 (2011);doi:10.1116/1.3662402.
- L.P. Muray, Scanning, 33, 155 (2011); doi:10.1002/sca.20245.
- Y.C. Kim, D.W. Kim, S. Ahn, T.S. Oh, J.B. Kim, Y.S. Roh, D.G. Hasko and H.S. Kim, J. Vac. Sci. Technol. B, 27, 3208 (2009); doi:10.1116/1.3272076.
- T.S. Oh, D.W. Kim, Y.C. Kim, S. Ahn, G.H. Lee and H.S. Kim, J. Vac. Sci. Technol. B, 28, C6C69 (2010); doi:10.1116/1.3502658.
- E. Kratschmer, H.S. Kim, M.G.R. Thomson, K.Y. Lee, S.A. Rishton, M.L. Yu and T.H.P. Chang, J. Vac. Sci. Technol. B, 13, 2498 (1995); doi:10.1116/1.588381.
- J.P. Spallas, C.S. Silver, L.P. Muray, T. Wells and M. El-Gomati, Microelectron. Eng., 83, 984 (2006); doi:10.1016/j.mee.2006.01.245.
- L.P. Muray, C.S. Silver and J.P. Spallas, J. Vac. Sci. Technol. B, 24, 2945 (2006); doi:10.1116/1.2375088.
- R. Saini, Z. Jandric, I. Gory, S.A.M. Mentink and D. Tuggle, J. Vac. Sci. Technol. B, 24, 813 (2006); doi:10.1116/1.2178374.
- M.G.R. Thomson and T.H.P. Chang, J. Vac. Sci. Technol. B, 13, 2445 (1995); doi:10.1116/1.588018.
- J.P. Spallas, C.S. Silver and L.P. Muray, J. Vac. Sci. Technol. B, 24, 2892 (2006); doi:10.1116/1.2395955.
- T.H.P. Chang, D.P. Kern and L.P. Muray, J. Vac. Sci. Technol. B, 8, 1698 (1990); doi:10.1116/1.585142.
- T.H.P. Chang, M.G.R. Thomson, M.L. Yu, E. Kratschmer, H.S. Kim, K.Y. Lee, S.A. Rishton and S. Zolgharnain, Microelectron. Eng., 32, 113 (1996); doi:10.1016/0167-9317(95)00366-5.
References
S.Y. Chen, H.T. Ng, S.Y. Ma, H.H. Chen, C.H. Liu and K.Y. Tsai, J. Vac. Sci. Technol. B, 29, 06FD04 (2011);doi:10.1116/1.3662402.
L.P. Muray, Scanning, 33, 155 (2011); doi:10.1002/sca.20245.
Y.C. Kim, D.W. Kim, S. Ahn, T.S. Oh, J.B. Kim, Y.S. Roh, D.G. Hasko and H.S. Kim, J. Vac. Sci. Technol. B, 27, 3208 (2009); doi:10.1116/1.3272076.
T.S. Oh, D.W. Kim, Y.C. Kim, S. Ahn, G.H. Lee and H.S. Kim, J. Vac. Sci. Technol. B, 28, C6C69 (2010); doi:10.1116/1.3502658.
E. Kratschmer, H.S. Kim, M.G.R. Thomson, K.Y. Lee, S.A. Rishton, M.L. Yu and T.H.P. Chang, J. Vac. Sci. Technol. B, 13, 2498 (1995); doi:10.1116/1.588381.
J.P. Spallas, C.S. Silver, L.P. Muray, T. Wells and M. El-Gomati, Microelectron. Eng., 83, 984 (2006); doi:10.1016/j.mee.2006.01.245.
L.P. Muray, C.S. Silver and J.P. Spallas, J. Vac. Sci. Technol. B, 24, 2945 (2006); doi:10.1116/1.2375088.
R. Saini, Z. Jandric, I. Gory, S.A.M. Mentink and D. Tuggle, J. Vac. Sci. Technol. B, 24, 813 (2006); doi:10.1116/1.2178374.
M.G.R. Thomson and T.H.P. Chang, J. Vac. Sci. Technol. B, 13, 2445 (1995); doi:10.1116/1.588018.
J.P. Spallas, C.S. Silver and L.P. Muray, J. Vac. Sci. Technol. B, 24, 2892 (2006); doi:10.1116/1.2395955.
T.H.P. Chang, D.P. Kern and L.P. Muray, J. Vac. Sci. Technol. B, 8, 1698 (1990); doi:10.1116/1.585142.
T.H.P. Chang, M.G.R. Thomson, M.L. Yu, E. Kratschmer, H.S. Kim, K.Y. Lee, S.A. Rishton and S. Zolgharnain, Microelectron. Eng., 32, 113 (1996); doi:10.1016/0167-9317(95)00366-5.