Issue
Copyright (c) 2014 Özlem Selçuk Kusçu*, Yasemin Kaplan
This work is licensed under a Creative Commons Attribution 4.0 International License.
Effect of Pulsed High-Voltage Discharge Process Combined with H2O2 and Fe2+ on Degradation of Phenol
Corresponding Author(s) : Özlem Selçuk Kusçu*
Asian Journal of Chemistry,
Vol. 26 No. 20 (2014)
Abstract
Degradation of phenol by pulsed high-voltage discharge is presented in this study. The effect of pulsed peak voltage, pH, temperature, conductivity, discharge gap, treatment time and phenol concentration on phenol degradation were investigated. In addition, the effect of ferrous(II) and hydrogen peroxide on pulsed high-voltage discharge process was evaluated. Experimental data show that the removal efficiency of phenol increased as the pulsed peak voltage, pH, temperature and treatment time increased and discharge gap and conductivity of solution decreased. The removal efficiency of phenol was 48, 46, 42 and 34 %, respectively at 10, 40, 90 and 160 ppm phenol solutions. The experiments were performed under discharge gap of 20 mm, an applied voltage of 24 kV, a solution pH of 10, a solution temperature of 30 ºC and a solution conductivity of 120 μS/cm. The degradation rate of phenol increased dramatically when Fe2+ and H2O2 were added into the solution. The removal efficiency of phenol reached 78, 72 and 71 % when 0.28-0.56 mM Fe2+ were added into phenol solutions of 40, 90 and 160 ppm, respectively. 100 % phenol removal efficiency was achieved when 20-40 mM H2O2 was added into phenol solutions of 10, 40, 90 and 160 ppm.
Keywords
Download Citation
Endnote/Zotero/Mendeley (RIS)BibTeX
- J.S. Clements, M. Sato and R.H. Davis, IEEE Trans. Ind. Appl., 23, 224 (1987).
- B. Sun, M. Sato and J.S. Clements, J. Phys. D Appl. Phys., 32, 1908 (1999).
- B. Sun, M. Sato and J.S. Clements, Environ. Sci. Technol., 34, 509 (2000).
- A.T. Sugiarto and M. Sato, Thin Solid Films, 386, 295 (2001).
- L. Zhu, J. Ma and S. Yang, J. Environ. Sci. (China), 19, 409 (2007).
- Y. Wen, X. Jiang and W. Liu, Plasma Chem. Plasma Process., 22, 177 (2002).
- Q.F. Lu, J. Yu and J.Z. Gao, J. Hazard. Mater. B, 136, 526 (2006).
- Y. Zhang, M.H. Zhou and L.C. Lei, Chem. Eng. J., 132, 325 (2007).
- W. Bian, X. Ying and J. Shi, J. Hazard. Mater., 162, 906 (2009).
- A.T. Sugiarto, S. Ito, T. Ohshima, M. Sato and J.D. Skalny, J. Electrost., 58, 135 (2003).
- E. Njatawidjaja, A. Tri Sugiarto, T. Ohshima and M. Sato, J. Electrost., 63, 353 (2005).
- M. Sato, D. Kon-no, T. Ohshima and A.T. Sugiarto, J. Ad. Oxi. Technol., 8, 198 (2005).
- J. Gong, J. Wang, W. Xie and W. Cai, J. Appl. Electrochem., 38, 1749 (2008).
- L. Zhang, B. Sun and X. Zhu, J. Electrost., 67, 62 (2009).
- Y. Shen, L. Lei, X. Zhang, M. Zhou and Y. Zhang, Energy Convers. Manage., 49, 2254 (2008).
- X.Yin, W. Bian and J. Shi, J. Hazard. Mater., 166, 1474 (2009).
- H. Wang, J. Chu, H. Ou, R. Zhao and J. Han, J. Electrost., 67, 886 (2009).
- Y. Zhang, S. Deng, B. Sun, H. Xiao, L. Li, G. Yang, Q. Hui, J. Wu and J. Zheng, J. Colloid Interf. Sci., 347, 260 (2010).
- H. Wang, Li, Quan, Wu, G. Li and F. Wang, J. Hazard. Mater., 141, 336 (2007).
- J. Li, M. Sato and T. Ohshima, Thin Solid Films, 515, 4283 (2007).
- W. Bian, M. Zhou and L. Lei, Plasma Chem. Plasma Process., 27, 337 (2007).
- J. Shi, W. Bian and X. Yin, J. Hazard. Mater., 171, 924 (2009).
- B. Sun, M. Sato and J. Sid Clements, J. Electrost., 39, 189 (1997).
- A.A. Joshi, B.R. Locke, P. Arce and W.C. Finney, J. Hazard. Mater., 41, 3 (1995).
- A.M. Anpilov, E.M. Barkhudarov, Y.B. Bark, Y.V. Zadiraka, M. Christofi, Y.N. Kozlov, I.A. Kossyi, V.A. Kop'ev, V.P. Silakov, M.I. Taktakishvili and S.M. Temchin, J. Phys. D Appl. Phys., 34, 993 (2001).
- A. Tri Sugiarto, T. Ohshima and M. Sato, Thin Solid Films, 407, 174 (2002).
- H. Yang, X. Zhang, S. Wen and W. Yuan, Chem. Eng. Technol., 32, 887 (2009).
- P. Lukes, M. Clupek, P. Sunka, F. Peterka, T. Sano, N. Negishi, S. Matsuzawa and K. Takeuchi, Res. Chem. Intermed., 31, 285 (2005).
- A.K. Sharma, B.R. Locke, P. Arce and W.C. Finney, Hazard. Waste Hazard. Mater., 10, 209 (1993).
- APHA-AWWA, WEF. Standard Methods for the Examination of Water and Wastewater, American Public Health Association, American Water Work Association, Water Environment Federation: Washington, DC, edn. 21 (2005).
- D. Mantha, Z. Aslam and T. Panda, Bioprocess Eng., 19, 285 (1998).
- Ö.S. Kusçu and D.T. Sponza, J. Hazard. Mater., 187, 222 (2011).
- Y.S. Chen, X.S. Zhang, Y.C. Dai and W.K. Yuan, Sep. Purif. Technol., 34, 5 (2004).
- Z. He, J. Liu and W. Cai, J. Electrost., 63, 371 (2005).
- Y. Shidong, C. Fengguo, Degradation of Nitrobenzene by Pulsed High Voltage Discharge in Water, Bioinformatics and Biomedical Engineering ICBBE. The 2nd International Conference on Date of Conference: 16/18 (2008).
- G. An, Y. Sun, T. Zhu and X. Yan, Chemosphere, 84, 1296 (2011).
- D.M. Willberg, P.S. Lang, R.H. Hochemer, A. Kratel and M.R. Hoffmann, Environ. Sci. Technol., 30, 2526 (1996).
- M.A. Malik, Plasma Sources Sci. Technol., 12, 526 (2003).
- B. Sun, M. Sato, A. Harano and J.S. Clements, J. Electrost., 43, 115 (1998).
References
J.S. Clements, M. Sato and R.H. Davis, IEEE Trans. Ind. Appl., 23, 224 (1987).
B. Sun, M. Sato and J.S. Clements, J. Phys. D Appl. Phys., 32, 1908 (1999).
B. Sun, M. Sato and J.S. Clements, Environ. Sci. Technol., 34, 509 (2000).
A.T. Sugiarto and M. Sato, Thin Solid Films, 386, 295 (2001).
L. Zhu, J. Ma and S. Yang, J. Environ. Sci. (China), 19, 409 (2007).
Y. Wen, X. Jiang and W. Liu, Plasma Chem. Plasma Process., 22, 177 (2002).
Q.F. Lu, J. Yu and J.Z. Gao, J. Hazard. Mater. B, 136, 526 (2006).
Y. Zhang, M.H. Zhou and L.C. Lei, Chem. Eng. J., 132, 325 (2007).
W. Bian, X. Ying and J. Shi, J. Hazard. Mater., 162, 906 (2009).
A.T. Sugiarto, S. Ito, T. Ohshima, M. Sato and J.D. Skalny, J. Electrost., 58, 135 (2003).
E. Njatawidjaja, A. Tri Sugiarto, T. Ohshima and M. Sato, J. Electrost., 63, 353 (2005).
M. Sato, D. Kon-no, T. Ohshima and A.T. Sugiarto, J. Ad. Oxi. Technol., 8, 198 (2005).
J. Gong, J. Wang, W. Xie and W. Cai, J. Appl. Electrochem., 38, 1749 (2008).
L. Zhang, B. Sun and X. Zhu, J. Electrost., 67, 62 (2009).
Y. Shen, L. Lei, X. Zhang, M. Zhou and Y. Zhang, Energy Convers. Manage., 49, 2254 (2008).
X.Yin, W. Bian and J. Shi, J. Hazard. Mater., 166, 1474 (2009).
H. Wang, J. Chu, H. Ou, R. Zhao and J. Han, J. Electrost., 67, 886 (2009).
Y. Zhang, S. Deng, B. Sun, H. Xiao, L. Li, G. Yang, Q. Hui, J. Wu and J. Zheng, J. Colloid Interf. Sci., 347, 260 (2010).
H. Wang, Li, Quan, Wu, G. Li and F. Wang, J. Hazard. Mater., 141, 336 (2007).
J. Li, M. Sato and T. Ohshima, Thin Solid Films, 515, 4283 (2007).
W. Bian, M. Zhou and L. Lei, Plasma Chem. Plasma Process., 27, 337 (2007).
J. Shi, W. Bian and X. Yin, J. Hazard. Mater., 171, 924 (2009).
B. Sun, M. Sato and J. Sid Clements, J. Electrost., 39, 189 (1997).
A.A. Joshi, B.R. Locke, P. Arce and W.C. Finney, J. Hazard. Mater., 41, 3 (1995).
A.M. Anpilov, E.M. Barkhudarov, Y.B. Bark, Y.V. Zadiraka, M. Christofi, Y.N. Kozlov, I.A. Kossyi, V.A. Kop'ev, V.P. Silakov, M.I. Taktakishvili and S.M. Temchin, J. Phys. D Appl. Phys., 34, 993 (2001).
A. Tri Sugiarto, T. Ohshima and M. Sato, Thin Solid Films, 407, 174 (2002).
H. Yang, X. Zhang, S. Wen and W. Yuan, Chem. Eng. Technol., 32, 887 (2009).
P. Lukes, M. Clupek, P. Sunka, F. Peterka, T. Sano, N. Negishi, S. Matsuzawa and K. Takeuchi, Res. Chem. Intermed., 31, 285 (2005).
A.K. Sharma, B.R. Locke, P. Arce and W.C. Finney, Hazard. Waste Hazard. Mater., 10, 209 (1993).
APHA-AWWA, WEF. Standard Methods for the Examination of Water and Wastewater, American Public Health Association, American Water Work Association, Water Environment Federation: Washington, DC, edn. 21 (2005).
D. Mantha, Z. Aslam and T. Panda, Bioprocess Eng., 19, 285 (1998).
Ö.S. Kusçu and D.T. Sponza, J. Hazard. Mater., 187, 222 (2011).
Y.S. Chen, X.S. Zhang, Y.C. Dai and W.K. Yuan, Sep. Purif. Technol., 34, 5 (2004).
Z. He, J. Liu and W. Cai, J. Electrost., 63, 371 (2005).
Y. Shidong, C. Fengguo, Degradation of Nitrobenzene by Pulsed High Voltage Discharge in Water, Bioinformatics and Biomedical Engineering ICBBE. The 2nd International Conference on Date of Conference: 16/18 (2008).
G. An, Y. Sun, T. Zhu and X. Yan, Chemosphere, 84, 1296 (2011).
D.M. Willberg, P.S. Lang, R.H. Hochemer, A. Kratel and M.R. Hoffmann, Environ. Sci. Technol., 30, 2526 (1996).
M.A. Malik, Plasma Sources Sci. Technol., 12, 526 (2003).
B. Sun, M. Sato, A. Harano and J.S. Clements, J. Electrost., 43, 115 (1998).