Issue

Vol. 26 No. 17 (2014): Vol 26 Issue 17

Copyright (c) 2014 AJC

Creative Commons License

This work is licensed under a Creative Commons Attribution 4.0 International License.

Preparation of Amorphous Coatings of AlFeCoNiCuZrV Alloy by Direct Current Magnetron Sputtering Method

https://doi.org/10.14233/ajchem.2014.18172
J. Zhang
Key Laboratory of Automobile Materials of Ministry of Education and School of Materials Science and Engineering, Jilin University, Changchun 130025, P.R. China
J.B. Zhu
Key Laboratory of Automobile Materials of Ministry of Education and School of Materials Science and Engineering, Jilin University, Changchun 130025, P.R. China
Z.Y. Sun
Key Laboratory of Automobile Materials of Ministry of Education and School of Materials Science and Engineering, Jilin University, Changchun 130025, P.R. China
J.C. Li
Key Laboratory of Automobile Materials of Ministry of Education and School of Materials Science and Engineering, Jilin University, Changchun 130025, P.R. China

Corresponding Author(s) : J.C. Li

ljc@jlu.edu.cn

Asian Journal of Chemistry, Vol. 26 No. 17 (2014): Vol 26 Issue 17

Abstract

The amorphous coatings of AlFeCoNiCuZrV high entropy alloy were deposited by direct current magnetron sputtering (DCMS) in the mixed atmosphere of Ar and O2. A smooth amorphous coating was obtained. The microstructure and properties of the coatings were investigated. The results showed that the chemical composition, microstructure and mechanical properties of the amorphous coatings intimately relied on the concentration of O2 in the mixture atmosphere. When O2 flow ratio increased, the thickness and roughness of the coatings decreased. The maximum values of the hardness and the elastic modulus of the coating are 12 and 168 Gpa, respectively.

Keywords

High entropy alloy Amorphous coating Properties Magnetron sputtering
Zhang, J., Zhu, J., Sun, Z., & Li, J. (2014). Preparation of Amorphous Coatings of AlFeCoNiCuZrV Alloy by Direct Current Magnetron Sputtering Method. Asian Journal of Chemistry, 26(17), 5627–5630. https://doi.org/10.14233/ajchem.2014.18172
Download Citation
Endnote/Zotero/Mendeley (RIS)
BibTeX
References
  1. J.W. Yeh, S.K. Chen, S.J. Lin, J.Y. Gan, T.S. Chin, T.T. Shun, C.-H. Tsau and S.-Y. Chang, Adv. Eng. Mater., 6, 299 (2004); doi:10.1002/adem.200300567.
  2. P.-K. Huang, J.-W. Yeh, T.-T. Shun and S.-K. Chen, Adv. Eng. Mater., 6, 74 (2004); doi:10.1002/adem.200300507.
  3. S.C. Liang, D.C. Tsai, Z.C. Chang, H.S. Sung, Y.C. Lin, J.W. Yeh, M.J. Deng and F.S. Shieu, Appl. Surf. Sci., 258, 399 (2011); doi:10.1016/j.apsusc.2011.09.006.
  4. K.H. Cheng, C.H. Lai, S.J. Lin and J.W. Yeh, Thin Solid Films, 519, 3185 (2011); doi:10.1016/j.tsf.2010.11.034.
  5. S.C. Liang, Z.C. Chang, D.C. Tsai, Y.-C. Lin, H.S. Sung, M.J. Deng and F.S. Shieu, Appl. Surf. Sci., 257, 7709 (2011); doi:10.1016/j.apsusc.2011.04.014.
  6. M.H. Tsai, J.W. Yeh and J.Y. Gan, Thin Solid Films, 516, 5527 (2008); doi:10.1016/j.tsf.2007.07.109.
  7. T.K. Chen, T.T. Shun, J.W. Yeh and M.S. Wong, Surf. Coat. Technol., 188-189, 193 (2004); doi:10.1016/j.surfcoat.2004.08.023.
  8. S.Y. Chang and D.S. Chen, Mater. Chem. Phys., 125, 5 (2011); doi:10.1016/j.matchemphys.2010.09.016.
  9. Y.Y. Chen, T. Duval, U.D. Hung, J.W. Yeh and H.C. Shih, Corros. Sci., 47, 2257 (2005); doi:10.1016/j.corsci.2004.11.008.
  10. H.K. Chen, S.H. Li and J.G. Duh, J. Electron. Mater., 34, 1480 (2005); doi:10.1007/s11664-005-0154-x.
  11. Y.J. Zhou, Y. Zhang, Y.L. Wang and G.L. Chen, Mater. Sci. Eng. A, 454-455, 260 (2007); doi:10.1016/j.msea.2006.11.049.
  12. Y.J. Zhou, Y. Zhang, Y.L. Wang and G.L. Chen, Appl. Phys. Lett., 90, 181904 (2007); doi:10.1063/1.2734517.
  13. Z. Hu, Y. Zhan, G. Zhang, J. She and C. Li, Mater. Des., 31, 1599 (2010); doi:10.1016/j.matdes.2009.09.016.
  14. C.-Y. Hsu, T.-S. Sheu, J.-W. Yeh and S.-K. Chen, Wear, 268, 653 (2010); doi:10.1016/j.wear.2009.10.013.
  15. C. Huang, Y.Z. Zhang, R. Vilar and J.Y. Shen, Mater. Des., 41, 338 (2012); doi:10.1016/j.matdes.2012.04.049.
  16. B. Ren, Z.X. Liu, B. Cai, M.X. Wang and L. Shi, Mater. Des., 33, 121 (2012); doi:10.1016/j.matdes.2011.07.005.
  17. C.W. Tsai, Y.L. Chen, M.H. Tsai, J.W. Yeh, T.T. Shun and S.-K. Chen, J. Alloys Comp., 486, 427 (2009); doi:10.1016/j.jallcom.2009.06.182.
  18. N. Senkov, G.B. Wilks, D.B. Miracle, C.P. Chuang and P.K. Liaw, Intermetallics, 18, 1758 (2010); doi:10.1016/j.intermet.2010.05.014.
  19. J. Musil, P. Karvánková and J. Kasl, Surf. Coat. Technol., 139, 101 (2001); doi:10.1016/S0257-8972(01)00989-6.
  20. M. Uchida, N. Nihira, A. Mitsuo, K. Toyoda, K. Kubota and T. Aizawa, Surf. Coat. Technol., 177-178, 627 (2004); doi:10.1016/S0257-8972(03)00937-X.
  21. C.W. Kim and K.H. Kim, Thin Solid Films, 307, 113 (1997); doi:10.1016/S0040-6090(97)00212-5.
  22. C.H. Lai, S.J. Lin, J.W. Yeh and S.Y. Chang, Surf. Coat. Technol., 201, 3275 (2006); doi:10.1016/j.surfcoat.2006.06.048.
  23. C.W. Tsai, S.W. Lai, K.H. Cheng, M.H. Tsai, A. Davison, C.H. Tsau and J.W. Yeh, Thin Solid Films, 520, 2613 (2012); doi:10.1016/j.tsf.2011.11.025.
  24. L. Liu, J.B. Zhu, C. Hou, J.-C. Li and Q. Jiang, Mater. Des., 46, 675 (2013); doi:10.1016/j.matdes.2012.11.001.
  25. H.W. Chang, P.K. Huang, A. Davison, J.W. Yeh, C.-H. Tsau and C.-C. Yang, Thin Solid Films, 516, 6402 (2008); doi:10.1016/j.tsf.2008.01.019.
  26. Y.S. Huang, L. Chen, H.W. Lui, M.H. Cai and J.W. Yeh, Mater. Sci. Eng. A, 457, 77 (2007); doi:10.1016/j.msea.2006.12.001.
  27. M.I. Lin, M.H. Tsai, W.J. Shen and J.W. Yeh, Thin Solid Films, 518, 2732 (2010); doi:10.1016/j.tsf.2009.10.142.
  28. A. Inoue, Mater. Trans. JIM, 36, 866 (1995); doi:10.2320/matertrans1989.36.866.
  29. H.O. Pierson, Handbook of Refractory Carbides and Nitrides, Noyes Publications, Westwood, New Jersey, P. 43 (1996).
  30. J.A. Dean, Lange's Handbook of Chemistry, McGraw-Hill, New York, p. 234 (1999).
  31. R.S. Mason and M. Pichilingi, J. Phys. D Appl. Phys., 27, 2363 (1994); doi:10.1088/0022-3727/27/11/017.
  32. B.N. Chapman, Glow Discharge Processes, John Wiley & Sons, New York, p. 230 (1980).
  33. J.A. Thornton, J. Vac. Sci. Technol. A, 4, 3059 (1986); doi:10.1116/1.573628.
  34. R. Messier, V.C. Venugopal and P.D. Sunal, J. Vac. Sci. Technol. A, 18, 1538 (2000); doi:10.1116/1.582381.
  35. C.Z. Yao, P. Zhang, M. Liu, G.R. Li, J.Q. Ye, P. Liu and Y.-X. Tong, Electrochim. Acta, 53, 8359 (2008); doi:10.1016/j.electacta.2008.06.036.
  36. M.H. Tsai, C.W. Wang, C.H. Lai, J.W. Yeh and J.Y. Gan, Appl. Phys. Lett., 92, 052109 (2008); doi:10.1063/1.2841810.
Read More
Author biographies is not available.
Download
PDF
Statistic
Read Counter : 0 Download : 0