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Effect of pH at Early Formed Structures in Cobalt Electrodeposition
Corresponding Author(s) : Sahari Ali
Asian Journal of Chemistry,
Vol. 25 No. 8 (2013): Vol 25 Issue 8
Abstract
The electrodeposition of cobalt on platinum wafer substrates was studied versus electrolyte pH. The crystallographic structure of electrodeposited cobalt films found to be very sensitive on the electrolyte pH value. During the first stage of growth, at pH = 2 a mixture of Cofcc and Cohcp are formed with the prevailing Cofcc phase. By increasing the pH (3.0 < pH < 4.0), Cohcp becomes the major fraction with good crystallization state and large grain sizes. Electrochemical impedance spectroscopy technique was used to describe the interface's behaviour and the passage steps of electrodeposition process. It was found that at pH = 2, the impedance spectra are characterized by the presence of a semicircle feature at high frequencies and by complex inductance at low frequencies. At pH (3.0 < pH < 4.0), the inductive feature disappears and replaced by capacitive feature indicating the control of electrodeposition by the deposition process.
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- J.H. Kefalas, Plating, 54, 543 (1967).
- T. Homma, Y. Kurokawa, M. Yammoto and T. Osaka, J. Surf. Finish. Soc. Jpn., 44, 1099 (1993).
- A. Sahari, A. Azizi, N. Fenineche, G. Schmerber and A. Dinia, Surf. Rev. Lett., 3, 391 (2005).
- J. Rivas, A.K.M. Bantu, G. Zaragoza, M.C. Blanco and M.A.L. Quintela, J. Magn. Mater., 249, 220 (2002).
- D.H. Qin, M. Lu and H.L. Li, Chem. Phys. Lett., 350, 51 (2001).
- M. Cerisier, K. Attenborough, E. Gedryka, M. Wojcik, S. Nadolski, C. Van Haesendonk and J.P. Celis, J. Appl. Phys., 89, 7083 (2001).
- R.M. Bozorth, Phys. Rev., 26, 390 (1925).
- P. Watts, Trans. Am. Electrochem. Soc., 29, 395 (1916).
- E. Gomez and E. Valles, J. Appl. Electrochem., 29, 805 (1999).
- J.L. Bubendorff, C. Meny, E. Beaurepaire, P. Panisod and J.P. Bucher, Eur. Phys. J. B, 17, 635 (2000).
- M. Cerisier, K. Attenborough, J.P. Celis and C. Van Haesendonk, Appl. Surf. Sci., 166, 154 (2000).
- C.Q. Gui and J.Y. Lee, Electrochim. Acta, 40, 1653 (1995).
- J.S. Sallo, J. Electrochem. Soc., 109, 1040 (1962).
- J.S. Judge, Plating, 53, 441 (1966).
- A. Sahari, A. Azizi, N. Fenineche, G. Schmerber and A. Dinia, Mater. Chem. Phys., 108, 345 (2007).
- S. Fletcher, C.S. Halliday, D. Gates, M. Westcott, T. Lwing and G. Nelson, J. Electroanal. Chem., 159, 267 (1983).
- A.N. Correia, S.A.S. Machado and L.A. Avaca, J. Electroanal. Chem., 488, 110 (2000).
- J. Chunxin, G. Oskam and P.C. Searson, Surf. Sci., 492, 115 (2001).
- L. Heerman and A. Tarallo, J. Electroanal. Chem., 470, 70 (1999).
- A. Sahari, A. Azizi, G. Schmerber, M. Abes, J.P. Bucher and A. Dinia, Catal. Today, 113, 257 (2006).
- L.T. Romankiw and T.A. Palumbo, in eds.: L.T. Romankiw and D.R. Turner, Electrodeposition Technology, Theory and Practice, ECS, NJ, p. 13 (1988).
- E.B. Budevski, in eds.: B.E. Conway, J.O.M. Bockris, E. Yeager, S.U.M. Kahn and R.E. White, Comprehensive Treatise of Electrochemistry, Plenum Press, New York, Vol. 7, p. 399 (1983).
- G. Oskam, J.G. Long, A. Natarajan and P.C. Searson, J. Phys. D, 31, 1927 (1998).
- B.R. Scharifker and G.J. Hills, Electrochim. Acta, 28, 879 (1983).
- E. Bosco and S.K. Rangarajan, J. Electroanal. Chem., 134, 213 (1982).
- C. Hammond, The Basics of Crystallography and Diffraction, Oxford University Press, Oxford (1997).
- R.D. Tilley and D.A. Jefferson, J. Mater. Chem., 12, 1 (2002).
- A.J. Bard and L.R. Faulkner, Electrochimie Principes, Méthodes et Applications, Paris, New York p. 354 (1983).
- B. Tremillon, Electrochimie Analytique et Réactions en Solution, Masson Paris Tome 2, p. 183 (1993).
References
J.H. Kefalas, Plating, 54, 543 (1967).
T. Homma, Y. Kurokawa, M. Yammoto and T. Osaka, J. Surf. Finish. Soc. Jpn., 44, 1099 (1993).
A. Sahari, A. Azizi, N. Fenineche, G. Schmerber and A. Dinia, Surf. Rev. Lett., 3, 391 (2005).
J. Rivas, A.K.M. Bantu, G. Zaragoza, M.C. Blanco and M.A.L. Quintela, J. Magn. Mater., 249, 220 (2002).
D.H. Qin, M. Lu and H.L. Li, Chem. Phys. Lett., 350, 51 (2001).
M. Cerisier, K. Attenborough, E. Gedryka, M. Wojcik, S. Nadolski, C. Van Haesendonk and J.P. Celis, J. Appl. Phys., 89, 7083 (2001).
R.M. Bozorth, Phys. Rev., 26, 390 (1925).
P. Watts, Trans. Am. Electrochem. Soc., 29, 395 (1916).
E. Gomez and E. Valles, J. Appl. Electrochem., 29, 805 (1999).
J.L. Bubendorff, C. Meny, E. Beaurepaire, P. Panisod and J.P. Bucher, Eur. Phys. J. B, 17, 635 (2000).
M. Cerisier, K. Attenborough, J.P. Celis and C. Van Haesendonk, Appl. Surf. Sci., 166, 154 (2000).
C.Q. Gui and J.Y. Lee, Electrochim. Acta, 40, 1653 (1995).
J.S. Sallo, J. Electrochem. Soc., 109, 1040 (1962).
J.S. Judge, Plating, 53, 441 (1966).
A. Sahari, A. Azizi, N. Fenineche, G. Schmerber and A. Dinia, Mater. Chem. Phys., 108, 345 (2007).
S. Fletcher, C.S. Halliday, D. Gates, M. Westcott, T. Lwing and G. Nelson, J. Electroanal. Chem., 159, 267 (1983).
A.N. Correia, S.A.S. Machado and L.A. Avaca, J. Electroanal. Chem., 488, 110 (2000).
J. Chunxin, G. Oskam and P.C. Searson, Surf. Sci., 492, 115 (2001).
L. Heerman and A. Tarallo, J. Electroanal. Chem., 470, 70 (1999).
A. Sahari, A. Azizi, G. Schmerber, M. Abes, J.P. Bucher and A. Dinia, Catal. Today, 113, 257 (2006).
L.T. Romankiw and T.A. Palumbo, in eds.: L.T. Romankiw and D.R. Turner, Electrodeposition Technology, Theory and Practice, ECS, NJ, p. 13 (1988).
E.B. Budevski, in eds.: B.E. Conway, J.O.M. Bockris, E. Yeager, S.U.M. Kahn and R.E. White, Comprehensive Treatise of Electrochemistry, Plenum Press, New York, Vol. 7, p. 399 (1983).
G. Oskam, J.G. Long, A. Natarajan and P.C. Searson, J. Phys. D, 31, 1927 (1998).
B.R. Scharifker and G.J. Hills, Electrochim. Acta, 28, 879 (1983).
E. Bosco and S.K. Rangarajan, J. Electroanal. Chem., 134, 213 (1982).
C. Hammond, The Basics of Crystallography and Diffraction, Oxford University Press, Oxford (1997).
R.D. Tilley and D.A. Jefferson, J. Mater. Chem., 12, 1 (2002).
A.J. Bard and L.R. Faulkner, Electrochimie Principes, Méthodes et Applications, Paris, New York p. 354 (1983).
B. Tremillon, Electrochimie Analytique et Réactions en Solution, Masson Paris Tome 2, p. 183 (1993).