Copyright (c) 2013 AJC
This work is licensed under a Creative Commons Attribution 4.0 International License.
Influence of [Bmim]HSO4 on the Nucleation and Growth of Zinc on Aluminum from Acidic Sulphate Bath
Corresponding Author(s) : Q.B. Zhang
Asian Journal of Chemistry,
Vol. 25 No. 2 (2013): Vol 25 Issue 2
Abstract
The effect of ionic liquid additive 1-butyl-3-methylimidazolium hydrogen sulphate-[Bmim]HSO4 on the nucleation and growth of zinc on aluminum from a 0.1 M ZnSO4 + 0.5 M Na2SO4 solution were investigated using cyclic voltammetry, chrono- amperometric current-time transients and scanning electron microscopy techniques. Dimensionless chronoamperometric current-time transients for zinc electrodeposition from the solution free of [Bmim]HSO4 were in good agreement with the theoretical transients for the limiting case of progressive nucleation with hemispherical diffusion-controlled growth of nuclei. The nucleation kinetics analysis suggested that active sites on the aluminum surface played the role of critical nuclei during the initial stages of the deposition process. The addition of [Bmim]HSO4 induced a blocking effect on the zinc electrodeposition process, leading to diminish the number of active sites for nucleus formation, decrease the nucleation and growth rate of the Zn2+ ions and modified the zinc crystal structure without affecting the progressive nucleation mechanism.
Keywords
Download Citation
Endnote/Zotero/Mendeley (RIS)BibTeX
- A. Sahari, A. Azizi, N. Fenineche, G. Schmerber and A. Dinia, Mater. Chem. Phys., 108, 345 (2008).
- R. Renuka, S. Ramamurthy and K. Muralidharan, J. Power Sources, 20, 197 (1998).
- J.J. Kelly, C. Tian and A.C. West, J. Electrochem. Soc., 146, 2540 (1999).
- F. Ganne, C. Cachet, G. Maurin, R. Wiart, E. Chauveau and J. Petitjean, J. Appl. Electrochem., 30, 665 (2000).
- Y.F. Lin and I.W. Sun, Electrochim. Acta, 44, 2771 (1999).
- L. Oniciu and L. Muresan, J. Appl. Electrochem., 21, 565 (1991).
- D.J. MacKinnon and J.M. Brannen, J. Appl. Electrochem., 12, 21 (1982).
- E. Michailova, M. Peykova, D. Stoychev and A. Milchev, J. Electroanal. Chem., 366, 195 (1994).
- L. Simanavicus,A. Stakenas and A. Sarkis, Electrochim. Acta, 42, 1581 (1997).
- E. Michailova, I. Vitanova, D. Stoychev and A. Milchev, Electrochim. Acta, 38, 2455 (1993).
- E. Budevski, G. Staikov and W.J. Lorenz, Electrochemical Phase Formation and Growth, Wiley-VCH, New York (1996).
- A.E. Alvarez and D.R. Salinas, J. Electroanal. Chem., 566, 393 (2004).
- G. Trejo, H. Ruiz, R.O. Borges and Y. Meas, J. Appl. Electrochem., 31, 685 (2001).
- G. Trejo, R. Ortega and Y. Meas, Plat. Surf. Finish, 89, 84 (2002).
- J.C. Ballesteros, P. D´iaz-Arista, Y. Meas, R. Ortega and G. Trejo,Electrochim. Acta, 52, 3686 (2007).
- J. Yu, L. Wang, L. Su, X. Ai and H. Yang, J. Electrochem. Soc., 150, C19 (2003).
- K. Raeissi, A. Saatchi and M.A. Golozar, J. Appl. Electrochem., 33, 635 (2003).
- P.J. Sonneveld, W. Visscher and E. Barendrecht, Electrochim. Acta, 37, 1199 (1992).
- Q.B. Zhang and Y.X. Hua, J. Appl. Electrochem., 39, 261 (2009).
- Q.B. Zhang and Y.X. Hua, J. Appl. Electrochem., 39, 1185 (2009).
- Q.B. Zhang, Y.X. Hua, Y.T. Wang, H.J. Lu and X.Y. Zhang, Hydrometallurgy, 98, 291 (2009).
- J.A. Whitehead, G.A. Lawrance and A. McCluskey, Aust. J. Chem., 57, 151 (2004).
- S. Fletcher, C.S. Halliday, D. Gates, M. Westcott, T. Lwin and G. Nelson, J. Electroanal. Chem., 159, 267 (1983).
- B. Lazar, A. Nishri and S. Ben-Yaakov, J. Electroanal. Chem., 125, 295 (1981).
- W.R. Pitner and C.L. Hussey, J. Electrochem. Soc., 144, 3095 (1997).
- B.R. Scharifker and G. Hills, Electrochim. Acta, 28, 879 (1983).
- P.M. Rigano, C. Mayer and T. Chierchie, J. Electroanal. Chem., 248, 219 (1988).
- G. Trejo,A.F. Gil and I. Gonzalez, J. Electrochem. Soc., 142, 3404 (1995).
- E. Michailova, I. Vitanova, D. Stoychev and A. Milchev, Electrochim. Acta, 38, 2455 (1993).
- G. Gunawardena, G. Hills and I. Montenegro, J. Electroanal. Chem., 184, 357 (1985).
- G. Gunawardena, G. Hills and I. Montenegro, J. Electroanal. Chem., 184, 371 (1985).
- J. Mostany, J. Parra and B.R. Scharifker, J. Appl. Electrochem., 16, 333 (1986).
- G. Gunawardena, G. Hills and I. Montenegro, J. Electroanal. Chem., 138, 241 (1982).
- A. Milchev, S. Stoyanov and R. Kaischev, Thin Solid Films, 22, 255 (1974).
- G. Barceló, M. Sarret, C. Müller and J. Pregonas, Electrochim. Acta, 43, 13 (1998).
- H. Yan, J. Downes, P.J. Boden and S.J. Harris, J. Electrochem. Soc., 143, 1577 (1996)
References
A. Sahari, A. Azizi, N. Fenineche, G. Schmerber and A. Dinia, Mater. Chem. Phys., 108, 345 (2008).
R. Renuka, S. Ramamurthy and K. Muralidharan, J. Power Sources, 20, 197 (1998).
J.J. Kelly, C. Tian and A.C. West, J. Electrochem. Soc., 146, 2540 (1999).
F. Ganne, C. Cachet, G. Maurin, R. Wiart, E. Chauveau and J. Petitjean, J. Appl. Electrochem., 30, 665 (2000).
Y.F. Lin and I.W. Sun, Electrochim. Acta, 44, 2771 (1999).
L. Oniciu and L. Muresan, J. Appl. Electrochem., 21, 565 (1991).
D.J. MacKinnon and J.M. Brannen, J. Appl. Electrochem., 12, 21 (1982).
E. Michailova, M. Peykova, D. Stoychev and A. Milchev, J. Electroanal. Chem., 366, 195 (1994).
L. Simanavicus,A. Stakenas and A. Sarkis, Electrochim. Acta, 42, 1581 (1997).
E. Michailova, I. Vitanova, D. Stoychev and A. Milchev, Electrochim. Acta, 38, 2455 (1993).
E. Budevski, G. Staikov and W.J. Lorenz, Electrochemical Phase Formation and Growth, Wiley-VCH, New York (1996).
A.E. Alvarez and D.R. Salinas, J. Electroanal. Chem., 566, 393 (2004).
G. Trejo, H. Ruiz, R.O. Borges and Y. Meas, J. Appl. Electrochem., 31, 685 (2001).
G. Trejo, R. Ortega and Y. Meas, Plat. Surf. Finish, 89, 84 (2002).
J.C. Ballesteros, P. D´iaz-Arista, Y. Meas, R. Ortega and G. Trejo,Electrochim. Acta, 52, 3686 (2007).
J. Yu, L. Wang, L. Su, X. Ai and H. Yang, J. Electrochem. Soc., 150, C19 (2003).
K. Raeissi, A. Saatchi and M.A. Golozar, J. Appl. Electrochem., 33, 635 (2003).
P.J. Sonneveld, W. Visscher and E. Barendrecht, Electrochim. Acta, 37, 1199 (1992).
Q.B. Zhang and Y.X. Hua, J. Appl. Electrochem., 39, 261 (2009).
Q.B. Zhang and Y.X. Hua, J. Appl. Electrochem., 39, 1185 (2009).
Q.B. Zhang, Y.X. Hua, Y.T. Wang, H.J. Lu and X.Y. Zhang, Hydrometallurgy, 98, 291 (2009).
J.A. Whitehead, G.A. Lawrance and A. McCluskey, Aust. J. Chem., 57, 151 (2004).
S. Fletcher, C.S. Halliday, D. Gates, M. Westcott, T. Lwin and G. Nelson, J. Electroanal. Chem., 159, 267 (1983).
B. Lazar, A. Nishri and S. Ben-Yaakov, J. Electroanal. Chem., 125, 295 (1981).
W.R. Pitner and C.L. Hussey, J. Electrochem. Soc., 144, 3095 (1997).
B.R. Scharifker and G. Hills, Electrochim. Acta, 28, 879 (1983).
P.M. Rigano, C. Mayer and T. Chierchie, J. Electroanal. Chem., 248, 219 (1988).
G. Trejo,A.F. Gil and I. Gonzalez, J. Electrochem. Soc., 142, 3404 (1995).
E. Michailova, I. Vitanova, D. Stoychev and A. Milchev, Electrochim. Acta, 38, 2455 (1993).
G. Gunawardena, G. Hills and I. Montenegro, J. Electroanal. Chem., 184, 357 (1985).
G. Gunawardena, G. Hills and I. Montenegro, J. Electroanal. Chem., 184, 371 (1985).
J. Mostany, J. Parra and B.R. Scharifker, J. Appl. Electrochem., 16, 333 (1986).
G. Gunawardena, G. Hills and I. Montenegro, J. Electroanal. Chem., 138, 241 (1982).
A. Milchev, S. Stoyanov and R. Kaischev, Thin Solid Films, 22, 255 (1974).
G. Barceló, M. Sarret, C. Müller and J. Pregonas, Electrochim. Acta, 43, 13 (1998).
H. Yan, J. Downes, P.J. Boden and S.J. Harris, J. Electrochem. Soc., 143, 1577 (1996)