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Preparation of TiO2 Thin Films by Potentiostatic Method: The Effects of Electrode Potential and Electrodeposition Temperature
Corresponding Author(s) : Shibiao Wu
Asian Journal of Chemistry,
Vol. 25 No. 10 (2013): Vol 25 Issue 10
Abstract
White films were electrodeposited by potentiostatic method on the indium tin oxide conductive glass substrate. After annealing at 450 ºC for 1 h, the films were characterized by XRD and SEM. According to the XRD patterns, the annealed films proved to be TiO2 with anatase phase structure. The effects of the experimental parameters such as electrodeposition potential and temperature on formation of the deposited films were discussed. The optimal electrode potential and desirable electrodeposition temperature were 1 V and 30 ºC, respectively.
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References
T.L. Thompson and J.T. Yates, Chem. Rev., 106, 4428 (2006).
M. Anpo, S. Dohshi, M. Kitano, Y. Hu, M. Takeuchi and M. Matsuoka, Ann. Rev. Mater. Res., 35, 1 (2005).
K. Maeda, K. Teramura, D.L. Lu, T. Takata, N. Saito, Y. Inoue and K. Domen, Nature, 440, 295 (2006).
P.V. Kamat, J. Phys. Chem. C, 111, 2834 (2007).
A. Kudo and Y. Miseki, Chem. Soc. Rev., 38, 253 (2009).
R. Asahi, T. Morikawa, T. Ohwaki, K. Aoki and Y. Taga, Science, 293, 269 (2001).
Y. Sakatani, D. Grosso, L. Nicole, C. Boissiere, G.J. de A.A. Soler-Illia and C. Sanchez, J. Mater. Chem., 16, 77 (2006).
E. Martinez-Ferrero, Y. Sakatani, C. Boissiere, D. Grosso, A. Fuertes, J. Fraxedas and C. Sanchez, Adv. Funct. Mater., 17, 3348 (2007).
X. Chen and S.S. Mao, Chem. Rev., 107, 2891 (2007).
Q. Wang, G. Wang, B. Xu, J. Jie, X. Han, G. Li, Q. Li and J.G. Hou, Mater. Lett., 59, 1378 (2005).
M. Izaki, M. Watanabe, H. Aritomo, I. Yamaguchi, S. Asahina, T. Shinagawa, M. Chigane, M. Inaba and A. Tasaka, Cryst. Growth Des., 8, 1418 (2008).
S. Wu, L. Xu, H. Xu, X. Chen, Y. Ge and S. Zhu, Asian J. Chem., 24, 3989 (2012).