Sulphur Ylide Initiated Photopolymerization of Methyl Methacrylate
Corresponding Author(s) : A. Mishra
Asian Journal of Chemistry,
Vol. 4 No. 2 (1992): Vol 4 Issue 2
Abstract
Solution polymerization of methyl methacrylate was carried out in the presence of visible light (440 nm) using 3-nitrophenacyl dimethyl sulfonium ylide as a photoinitiator at 30ºC. The initiator and monomer exponent values were calculated to be 0.49 and 1.0 respectively. An average value of Kp2/KT was 2.0 x 10–2. The polymerization was restarted in the presence of benzoquinone. Kinetic data and ESR studies indicate that the overall polymerization takes place by radical mechanism.
Keywords
Sulphur Ylide
Photopolymerization
Methyl Methacrylate
Mishra, A., & Mathur, G. (2010). Sulphur Ylide Initiated Photopolymerization of Methyl Methacrylate . Asian Journal of Chemistry, 4(2), 201–205. Retrieved from https://asianpubs.org/index.php/ajchem/article/view/25026
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