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Comparison of Electron Emission Characteristics of W and CNT Field Emitter for Microcolumn
Corresponding Author(s) : Young Chul Kim
Asian Journal of Chemistry,
Vol. 29 No. 8 (2017): Vol 29 Issue 8
Abstract
In a microcolumn, a sharp tungsten tip fabricated through electrochemical etching process is usually used as an electron emitter. However, the process of alignment of the tungsten tip with the extractor aperture is a bottleneck in the assembly of a microcolumn. We have considered both tungsten tip and two dimensionally distributed carbon nanotube emitter as the electron emission source and compared their electron emission characteristics in a microcolumn by assembling test columns.
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- L.P. Muray, U. Staufer, D. Kern and T.H.P. Chang, J. Vac. Sci. Technol. B, 10, 2749 (1992); https://doi.org/10.1116/1.585995.
- E. Kraschmer, H.S. Kim, M.G.R. Thomson, K.Y. Lee and S.A. Roshton, J. Vac. Sci. Technol. B, 14, 3792 (1996); https://doi.org/10.1116/1.588669.
- A. Singh, R. Mukherjee, K. Turner and S. Shaw, J. Sound Vibrat., 286, 637 (2005); https://doi.org/10.1016/j.jsv.2004.12.010.
- T.H.P. Chang, M.G.R. Thomson, E. Kratschmer, H.S. Kim, M.L. Yu, K.Y. Lee, S.A. Rishton, B.W. Hussey and S. Zolgharnain, J. Vac. Sci. Technol. B, 14, 3774 (1996); https://doi.org/10.1116/1.588666.
- L.P. Muray, K.Y. Lee, J.P. Spallas, M. Mankos, Y. Hsu, M.R. Gmur, H.S. Gross, C.B. Stebler and T.H.P. Chang, Microelectron. Eng., 53, 271 (2000); https://doi.org/10.1016/S0167-9317(00)00313-0.
- T.H.P. Chang, M. Mankos, K.Y. Lee and L.P. Muray, Microelectron. Eng., 57-58, 117 (2001); https://doi.org/10.1016/S0167-9317(01)00528-7.
- Y.C. Kim, D.W. Kim, S. Ahn, T.S. Oh, J.B. Kim, Y.S. Roh, D.G. Hasko and H.S. Kim, J. Vac. Sci. Technol. A, 27, 3208 (2009); https://doi.org/10.1116/1.3272076.
- T.S. Oh, D.W. Kim, Y.C. Kim, S.J. Ahn, G.H. Lee and H.S. Kim, J. Vac. Sci. Technol. B, 28, C6C69,C6C73 (2010); https://doi.org/10.1116/1.3502658.
- G. Tahmasebipour, V. Ahmadi and A. Abdullah, J. Sci. Islamic Repub. Iran, 21, 75 (2010).
- H.S. Kim, D.W. Kim, S.J. Ahn, Y.C. Kim, S.S. Park, S.K. Choi and D.Y. Kim, J. Korean Phys. Soc., 43, 831 (2003).
References
L.P. Muray, U. Staufer, D. Kern and T.H.P. Chang, J. Vac. Sci. Technol. B, 10, 2749 (1992); https://doi.org/10.1116/1.585995.
E. Kraschmer, H.S. Kim, M.G.R. Thomson, K.Y. Lee and S.A. Roshton, J. Vac. Sci. Technol. B, 14, 3792 (1996); https://doi.org/10.1116/1.588669.
A. Singh, R. Mukherjee, K. Turner and S. Shaw, J. Sound Vibrat., 286, 637 (2005); https://doi.org/10.1016/j.jsv.2004.12.010.
T.H.P. Chang, M.G.R. Thomson, E. Kratschmer, H.S. Kim, M.L. Yu, K.Y. Lee, S.A. Rishton, B.W. Hussey and S. Zolgharnain, J. Vac. Sci. Technol. B, 14, 3774 (1996); https://doi.org/10.1116/1.588666.
L.P. Muray, K.Y. Lee, J.P. Spallas, M. Mankos, Y. Hsu, M.R. Gmur, H.S. Gross, C.B. Stebler and T.H.P. Chang, Microelectron. Eng., 53, 271 (2000); https://doi.org/10.1016/S0167-9317(00)00313-0.
T.H.P. Chang, M. Mankos, K.Y. Lee and L.P. Muray, Microelectron. Eng., 57-58, 117 (2001); https://doi.org/10.1016/S0167-9317(01)00528-7.
Y.C. Kim, D.W. Kim, S. Ahn, T.S. Oh, J.B. Kim, Y.S. Roh, D.G. Hasko and H.S. Kim, J. Vac. Sci. Technol. A, 27, 3208 (2009); https://doi.org/10.1116/1.3272076.
T.S. Oh, D.W. Kim, Y.C. Kim, S.J. Ahn, G.H. Lee and H.S. Kim, J. Vac. Sci. Technol. B, 28, C6C69,C6C73 (2010); https://doi.org/10.1116/1.3502658.
G. Tahmasebipour, V. Ahmadi and A. Abdullah, J. Sci. Islamic Repub. Iran, 21, 75 (2010).
H.S. Kim, D.W. Kim, S.J. Ahn, Y.C. Kim, S.S. Park, S.K. Choi and D.Y. Kim, J. Korean Phys. Soc., 43, 831 (2003).