Fabrication and Characterization of a Low Voltage Micro-Electron Column for Scan Field Size and Magnification
Asian Journal of Chemistry,
Vol. 23 No. 5 (2011): Vol 23 Issue 5
Abstract
Fabrication and characterization of a low voltage micro-electron column are reviewed. Many optical technologies in fabrication of a micro-electron-column such as laser aid optical alignment and in situ laser bonding are introduced in assembling basic components of micro-electron column. The maximum field of view and scan field size were investigated as a function of biased voltage of deflectors and electron emission tip voltage. The magnification and the linearity of zooming current image dependant on the electron emission tip voltage are also discussed.
Keywords
Fabrication
Low voltage micro-electron column
Scan field size
Magnification.
Chul Kim1, Y., Seob Kim2, H., Oh Park3, J., & Kweon Jang3, W. (2011). Fabrication and Characterization of a Low Voltage Micro-Electron Column for Scan Field Size and Magnification. Asian Journal of Chemistry, 23(5), 2303–2305. Retrieved from https://asianpubs.org/index.php/ajchem/article/view/10321
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