TY - JOUR AU - Jasmin Vijitha, S.K. AU - Mohanraj, K. AU - Jebin, R.P. PY - 2022/12/27 Y2 - 2024/03/29 TI - Spray Deposited Ni Doped Co3O4 Thin Films for Electrochemical Applications JF - Asian Journal of Chemistry JA - ajc VL - 35 IS - 1 SE - Articles DO - 10.14233/ajchem.2023.23991 UR - https://asianpubs.org/index.php/ajchem/article/view/35_1_33 SP - 239-246 AB - <p style="text-align: justify;">Nickel-doped Co<sub>3</sub>O<sub>4</sub> films were prepared using fluorine doped tin oxide (FTO) substrates at various nickel concentrations (<em>x</em> = 0.025, 0.05, 0.075 and 0.1) using a spray pyrolyzed process at 300 ÂșC. Experimental techniques were used to characterize the materials by XRD, SEM, EDAX, UV-Vis, FTIR spectroscopy, magnetic susceptibility and cyclic voltammetry. When nickel is present in any concentration of Co<sub>3</sub>O<sub>4</sub>, the structural analysis using XRD confirms the spinel cubic structure of the material. By using a scanning electron microscope, porous morphological studies are conducted. EDAX examines the chemical composition of the prepared thin films. A 0.050 M concentrations demonstrated the ideal structure, good morphological analysis and energy bandgap. Based on the results, the prepared films were effectively used in the electrochemical performance.</p> ER -