He G, Zhang J, Chen X, Deng B, Song X, Sun Z. Deposition and Determination of Band Alignment of Al2O3/Si Gate Stacks by New CVD Chemistry. ajc [Internet]. 2014 Mar. 4 [cited 2024 Jul. 23];26(5):1563-4. Available from: https://asianpubs.org/index.php/ajchem/article/view/26_6_89