CHEN, Shaohua; DING, Yi; ZHAO, Donglin; LU, Daorong; WANG, Jiaquan. Electrochemical Behaviour of Arsenic on Copper Deposition Reaction in the Low Copper Concentration Electrolyte. Asian Journal of Chemistry, [S. l.], v. 25, n. 10, p. 5707–5709, 2013. DOI: 10.14233/ajchem.2013.OH68. Disponível em: https://asianpubs.org/index.php/ajchem/article/view/25_10_120. Acesso em: 30 jun. 2024.