HE, Gang; ZHANG, Jiwen; CHEN, Xuefei; DENG, Bin; SONG, Xueping; SUN, Zhaoqi. Deposition and Determination of Band Alignment of Al2O3/Si Gate Stacks by New CVD Chemistry. Asian Journal of Chemistry, [S. l.], v. 26, n. 5, p. 1563–1564, 2014. DOI: 10.14233/ajchem.2014.17314. Disponível em: https://asianpubs.org/index.php/ajchem/article/view/26_6_89. Acesso em: 23 jul. 2024.